The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2008
Filed:
Nov. 04, 2004
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Saitama, JP;
Shinichi Sumida, Saitama, JP;
Satoru Miyazawa, Saitama, JP;
Michitaka Ootani, Saitama, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Saitama, JP;
Shinichi Sumida, Saitama, JP;
Satoru Miyazawa, Saitama, JP;
Michitaka Ootani, Saitama, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.