The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Dec. 03, 2009
Haruhiko Komoriya, Iruma-gun, JP;
Shinichi Sumida, Kawagoe, JP;
Kenjin Inomiya, Fujimino, JP;
Takashi Mori, Fujimino, JP;
Takamasa Kitamoto, Asaka, JP;
Yusuke Kanto, Fujimino, JP;
Haruhiko Komoriya, Iruma-gun, JP;
Shinichi Sumida, Kawagoe, JP;
Kenjin Inomiya, Fujimino, JP;
Takashi Mori, Fujimino, JP;
Takamasa Kitamoto, Asaka, JP;
Yusuke Kanto, Fujimino, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, Rrepresents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). Rand Reach independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile