The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Dec. 11, 2009
Haruhiko Komoriya, Iruma-gun, JP;
Shinichi Sumida, Kawagoe, JP;
Kenjin Inomiya, Fujimino, JP;
Takashi Mori, Fujimino, JP;
Takamasa Kitamoto, Asaka, JP;
Yusuke Kanto, Fujimino, JP;
Haruhiko Komoriya, Iruma-gun, JP;
Shinichi Sumida, Kawagoe, JP;
Kenjin Inomiya, Fujimino, JP;
Takashi Mori, Fujimino, JP;
Takamasa Kitamoto, Asaka, JP;
Yusuke Kanto, Fujimino, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, Rrepresents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and Ror Rrepresents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.