The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2010

Filed:

Nov. 16, 2007
Applicants:

Haruhiko Komoriya, Kawagoe, JP;

Shinichi Sumida, Kawagoe, JP;

Katsunori Kawamura, Kawagoe, JP;

Satoru Kobayashi, Kawagoe, JP;

Satoru Miyazawa, Kawagoe, JP;

Kazuhiko Maeda, Kawagoe, JP;

Inventors:

Haruhiko Komoriya, Kawagoe, JP;

Shinichi Sumida, Kawagoe, JP;

Katsunori Kawamura, Kawagoe, JP;

Satoru Kobayashi, Kawagoe, JP;

Satoru Miyazawa, Kawagoe, JP;

Kazuhiko Maeda, Kawagoe, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 313/00 (2006.01); C08F 214/26 (2006.01); C08F 18/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.


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