The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Jul. 14, 2014
Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Yoshiharu Terui, Matsusaka, JP;

Haruhiko Komoriya, Saitama, JP;

Fumito Kobayashi, Matsusaka, JP;

Yukari Hara, Fujimino, JP;

Ikunari Hara, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/52 (2006.01); H01L 51/00 (2006.01); C09D 133/16 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); H01L 51/05 (2006.01); C08K 5/02 (2006.01); C08K 5/06 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0018 (2013.01); C09D 133/16 (2013.01); G03F 7/0002 (2013.01); G03F 7/0046 (2013.01); G03F 7/0048 (2013.01); H01L 51/0019 (2013.01); C08K 5/02 (2013.01); C08K 5/06 (2013.01); H01L 51/0052 (2013.01); H01L 51/0558 (2013.01);
Abstract

A film-forming composition according to the present invention include fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), Reach independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and Reach independently represents C-Cstraight, C-Cbranched or C-Ccyclic fluorine-containing hydrocarbon gr which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.


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