The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Apr. 20, 2010
Kazuhiko Maeda, Tokyo, JP;
Takamasa Kitamoto, Asaka, JP;
Haruhiko Komoriya, Iruma-gun, JP;
Satoru Narizuka, Saitama, JP;
Yoshimi Isono, Kawagoe, JP;
Kazunori Mori, Iruma-gun, JP;
Kazuhiko Maeda, Tokyo, JP;
Takamasa Kitamoto, Asaka, JP;
Haruhiko Komoriya, Iruma-gun, JP;
Satoru Narizuka, Saitama, JP;
Yoshimi Isono, Kawagoe, JP;
Kazunori Mori, Iruma-gun, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, Rrepresents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, Rrepresents a heat-labile protecting group, Rrepresents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]