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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9966575 B1

PDFFull Text
Date of Patent:
May. 08, 2018

Filed:

Jul. 14, 2014

Composition for forming films, film produced from said composition, and method for producing organic semiconductor element using said composition

Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Haruhiko Komoriya, Saitama, JP;

Yoshiharu Terui, Matsusaka, JP;

Fumito Kobayashi, Matsusaka, JP;

Yukari Hara, Fujimino, JP;

Ikunari Hara, Saitama, JP;

Assignee:

Central Glass Company, Limited, Ube-shi, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Mark Kaucher

Assistant Examiner:

Henry Hu

Int. Cl.
CPC ...
H01L 51/00 (2006.01); C08F 220/24 (2006.01); H01L 51/56 (2006.01); C09D 127/12 (2006.01); G03F 7/00 (2006.01); C09D 5/00 (2006.01); C09D 7/00 (2018.01); C09D 129/10 (2006.01); C09D 145/00 (2006.01); G03F 7/038 (2006.01); H01L 27/32 (2006.01); C08F 232/04 (2006.01); H01L 51/05 (2006.01); C08K 5/02 (2006.01); C08K 5/06 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/56 (2013.01); C08F 232/04 (2013.01); C09D 5/00 (2013.01); C09D 7/001 (2013.01); C09D 127/12 (2013.01); C09D 129/10 (2013.01); C09D 145/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/038 (2013.01); H01L 27/3241 (2013.01); H01L 51/0017 (2013.01); H01L 51/0018 (2013.01); H01L 51/0019 (2013.01); C08K 5/02 (2013.01); C08K 5/06 (2013.01); H01L 51/0052 (2013.01); H01L 51/0558 (2013.01); H01L 51/5012 (2013.01);
Abstract

A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), Rrepresents a C-Cstraight, C-Cbranched or C-Ccyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

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