GeonGon Lee

Title: GeonGon Lee: Innovator in Photomask Technology

Introduction

GeonGon Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work focuses on developing advanced materials and methods that enhance the performance of photomasks used in various applications.

Latest Patents

GeonGon Lee's latest patents include innovative designs for blank masks and photomasks. One of his notable patents describes a blank mask that consists of a transparent substrate. This patent also details a light shielding film that is applied to the transparent substrate. The light shielding film incorporates a transition metal and at least one element selected from oxygen and nitrogen. Furthermore, the surface of the light shielding film is engineered to have a first contact angle of 40° to 45° when measured with diiodo-methane.

Career Highlights

GeonGon Lee is currently employed at Sk Enpulse Co., Ltd., where he continues to push the boundaries of photomask technology. His expertise and innovative approach have positioned him as a key figure in his field. His contributions are vital for advancements in manufacturing processes that rely on high-quality photomasks.

Collaborations

GeonGon Lee collaborates with talented individuals in his field, including Inkyun Shin and Hyung-Joo Lee. These partnerships enhance the research and development efforts at Sk Enpulse Co., Ltd. and contribute to the success of their projects.

Conclusion

GeonGon Lee is a dedicated inventor whose work in photomask technology is paving the way for future innovations. His patents reflect a commitment to advancing the industry and improving manufacturing processes. His contributions are invaluable to the field, and his ongoing work promises to yield further advancements in technology.