The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Apr. 28, 2023
Applicant:
Luminamask Co., Ltd., Cheonan-si, KR;
Inventors:
Seong Yoon Kim, Seoul, KR;
Geongon Lee, Seoul, KR;
Min Gyo Jeong, Seoul, KR;
Sung Hoon Son, Seoul, KR;
Inkyun Shin, Seoul, KR;
Assignee:
LuminaMask Co., Ltd., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01); G03F 1/68 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G03F 1/68 (2013.01); G03F 7/2047 (2013.01); G03F 7/706851 (2023.05);
Abstract
A shadow mask includes a mask including one surface, another surface, and an opening that passes from one surface to the other, and a shutter provided on the one surface of the mask and configured to adjust a size of the opening, wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening, and the shadow mask is applied in manufacturing a blank mask for a semiconductor lithography process.