Seong Yoon Kim

Title: Seong Yoon Kim: Innovator in Photomask Technology

Introduction

Seong Yoon Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 6 patents. His work focuses on developing advanced materials and methods that enhance the performance of photomasks used in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Blank mask and photomask using the same." This invention includes a blank mask that features a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film placed on the phase shift film. The phase shift film is characterized by an XRD maximum peak at 2θ of 15° to 30° when normal mode XRD analysis is performed on its upper surface. Similarly, the transparent substrate also exhibits an XRD maximum peak at 2θ of 15° to 30° during normal mode XRD analysis on its lower surface. The AI1 value of the blank mask is expressed by a specific equation, with a range of 0.9 to 1.1. This innovation aims to improve the efficiency and accuracy of photomasks in various applications.

Career Highlights

Seong Yoon Kim is currently employed at Sk Enpulse Co., Ltd., where he continues to push the boundaries of photomask technology. His expertise and innovative approach have positioned him as a key figure in the industry.

Collaborations

Throughout his career, Seong Yoon Kim has collaborated with notable colleagues, including Inkyun Shin and Sung Hoon Son. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Seong Yoon Kim's contributions to photomask technology are noteworthy, and his innovative patents reflect his commitment to advancing the field. His work continues to influence the semiconductor industry, paving the way for future innovations.