The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Aug. 30, 2022
Applicant:
SK Enpulse Co., Ltd., Pyeongtaek-si, KR;
Inventors:
Geongon Lee, Seoul, KR;
Suk Young Choi, Seoul, KR;
Hyung-Joo Lee, Seoul, KR;
Sung Hoon Son, Seoul, KR;
Seong Yoon Kim, Seoul, KR;
Min Gyo Jeong, Seoul, KR;
Taewan Kim, Seoul, KR;
Inkyun Shin, Seoul, KR;
Assignee:
SK enpulse Co., Ltd., Pyeongtaek-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/32 (2012.01); G03F 1/50 (2012.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01); G03F 1/50 (2013.01);
Abstract
A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface of the light shielding film has a first contact angle of 40° to 45° measured by using diiodo-methane as a first liquid contacting the surface of the light shielding film, is disclosed.