The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Jul. 12, 2022
SK Enpulse Co., Ltd., Pyeongtaek-si, KR;
Geongon Lee, Seoul, KR;
Suk Young Choi, Seoul, KR;
Hyung-Joo Lee, Seoul, KR;
Suhyeon Kim, Seoul, KR;
Sung Hoon Son, Seoul, KR;
Seong Yoon Kim, Seoul, KR;
Min Gyo Jeong, Seoul, KR;
Hahyeon Cho, Seoul, KR;
Taewan Kim, Seoul, KR;
Inkyun Shin, Seoul, KR;
SK enpulse Co., Ltd., Pyeongtaek-si, KR;
Abstract
Disclosed is a blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, wherein when a surface of the light shielding film includes nine sectors formed by trisecting the surface of the light shielding film vertically and horizontally, each of the nine sectors has a Rsk value, respectively, and an average value of the Rsk values of the nine sectors is equal to −0.64 or more and less than or equal to 0, where Rsk value is a height symmetry of the surface of the light shielding film measured in accordance with ISO_4287, and wherein an average value of Rku values, which are kurtosis of the surface of the light shielding film measured in accordance with ISO_4287, of the nine sectors is 3 or less.