Company Filing History:
Years Active: 2025
Title: HaHyeon Cho: Innovator in Photomask Technology
Introduction
HaHyeon Cho is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 2 patents. His work focuses on developing advanced materials and methods that enhance the performance of photomasks used in various applications.
Latest Patents
Among his latest patents is a blank mask and photomask that includes a transparent substrate and a light shielding film. This innovative light shielding film is composed of a transition metal and at least one element selected from oxygen and nitrogen. The design features a surface divided into nine sectors, each with specific Rsk values, which measure the height symmetry of the film's surface. The average Rsk value of these sectors is maintained between −0.64 and 0, while the kurtosis of the surface is capped at 3 or less. This patent represents a significant advancement in the efficiency and effectiveness of photomasks.
Career Highlights
HaHyeon Cho is currently employed at Sk Enpulse Co., Ltd., where he continues to push the boundaries of innovation in photomask technology. His expertise and dedication to research have positioned him as a key figure in his field.
Collaborations
Throughout his career, HaHyeon has collaborated with talented individuals such as GeonGon Lee and Inkyun Shin. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
HaHyeon Cho's contributions to photomask technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of material science and engineering, paving the way for future advancements in the industry.