Sk Enpulse Co., Ltd.

HaHyeon Cho

Sung Hoon Son

Suhyeon Kim

Hyung-Joo Lee

Suk Young Choi

Inkyun Shin

Min Gyo Jeong

Seong Yoon Kim

GeonGon Lee

Taewan Kim

Disclosed is a blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, wherein when a surface of the light shielding film includes nine sectors formed by trisecting the surface of the light shielding film vertically and horizontally, each of the nine sectors has a Rsk value, respectively, and an average value of the Rsk values of the nine sectors is equal to −0.64 or more and less than or equal to 0, where Rsk value is a height symmetry of the surface of the light shielding film measured in accordance with ISO_4287, and wherein an average value of Rku values, which are kurtosis of the surface of the light shielding film measured in accordance with ISO_4287, of the nine sectors is 3 or less.

Blank mask and photomask using the same

The present disclosure relates to a blank mask including: a transparent substrate; and

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Seoul, South Korea

HaHyeon Cho