The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Jan. 03, 2022
Applicant:
SK Enpulse Co., Ltd., Pyeongtaek-si, KR;
Inventors:
Hyung-Joo Lee, Suwon-si, KR;
Jiyeon Ryu, Suwon-si, KR;
Kyuhun Kim, Suwon-si, KR;
Inkyun Shin, Suwon-si, KR;
Seong Yoon Kim, Suwon-si, KR;
Suk Young Choi, Suwon-si, KR;
Suhyeon Kim, Suwon-si, KR;
Sung Hoon Son, Suwon-si, KR;
Min Gyo Jeong, Suwon, KR;
Assignee:
SK enpulse Co., Ltd., Pyeongtaek-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/32 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01);
Abstract
The present disclosure relates to a blank mask and the like, and comprises a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The blank mask has a TFT1 value of 0.25 μm/100° C. or less expressed by Equation 1 below: