Jiyeon Ryu

Title: Jiyeon Ryu: Innovator in Photomask Technology

Introduction

Jiyeon Ryu is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 5 patents. His innovative work focuses on the development of advanced materials and techniques that enhance the performance of photomasks.

Latest Patents

One of Jiyeon Ryu's latest patents is a blank mask and photomask that utilizes a transparent substrate, a phase shift film, and a light shielding film. The phase shift film is designed to have an XRD maximum peak at 2θ of 15° to 30° when subjected to normal mode XRD analysis. Additionally, the transparent substrate also exhibits an XRD maximum peak at the same range during analysis. The blank mask is characterized by an AI1 value ranging from 0.9 to 1.1, which is crucial for its performance. Furthermore, the blank mask has a TFT1 value of 0.25 μm/100° C. or less, indicating its efficiency in high-temperature applications.

Career Highlights

Throughout his career, Jiyeon Ryu has worked with notable companies such as SKC Co., Ltd. and SK Enpulse Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in photomask technology.

Collaborations

Jiyeon Ryu has collaborated with talented individuals in his field, including Hyejin Kim and Sungjin Chung. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jiyeon Ryu is a distinguished inventor whose work in photomask technology has led to significant advancements in the industry. His patents reflect a deep understanding of material science and engineering principles. His contributions continue to influence the development of cutting-edge technologies in the field.