The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Jan. 04, 2021
Applicant:

SK Microworks Co., Ltd., Suwon-si, KR;

Inventors:

Hyejin Kim, Suwon-si, KR;

Jooyoung Jung, Pyeongtaek-si, KR;

Jiyeon Ryu, Suwon-si, KR;

Jewon Yeon, Suwon-si, KR;

Assignee:

SK microworks Co., Ltd., Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 29/14 (2006.01); B32B 17/10 (2006.01); C08K 5/092 (2006.01);
U.S. Cl.
CPC ...
C08L 29/14 (2013.01); B32B 17/10036 (2013.01); B32B 17/10605 (2013.01); B32B 17/10761 (2013.01); C08K 5/092 (2013.01); B32B 2250/03 (2013.01); B32B 2250/40 (2013.01); B32B 2307/412 (2013.01); B32B 2329/06 (2013.01); B32B 2605/006 (2013.01); B32B 2605/08 (2013.01); C08L 2203/16 (2013.01);
Abstract

The method of producing a polyvinyl butyral resin of the present disclosure enable manufacture of a film of which yellow index is low and durability is enhanced, when a film for lamination is manufactured, by advancing acetalization reaction of a polyvinyl alcohol resin and a butanal in the presence of a hydroxy butyric acid.


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