The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Nov. 28, 2022
SK Enpulse Co., Ltd., Pyeongtaek-si, KR;
Taewan Kim, Seoul, KR;
Geongon Lee, Seoul, KR;
Sukyoung Choi, Seoul, KR;
Hyungjoo Lee, Seoul, KR;
Suhyeon Kim, Seoul, KR;
Sunghoon Son, Seoul, KR;
Seongyoon Kim, Seoul, KR;
Mingyo Jeong, Seoul, KR;
Hahyeon Cho, Seoul, KR;
Inkyun Shin, Seoul, KR;
SK enpulse Co., Ltd., Pyeongtaek-si, KR;
Abstract
A laminate for a blank mask includes a light-transmitting layer; a phase shift film disposed on the light-transmitting layer; and residual ions measured from a surface of the phase shift film through ion chromatography comprises at least one of sulfate ions in a concentration of 0 ng/cmto 0.05 ng/cm, nitric oxide ions in a concentration of 0 ng/cmto 0.5 ng/cm, or ammonium ions in a concentration of 0 ng/cmto 5 ng/cm, or any combination thereof. A sum of concentrations of the residual ions is more than 0.