The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2026

Filed:

Nov. 03, 2022
Applicant:

SK Enpulse Co., Ltd., Pyeongtaek-si, KR;

Inventors:

Sung Hoon Son, Seoul, KR;

Geongon Lee, Seoul, KR;

Suk Young Choi, Seoul, KR;

Hyung-Joo Lee, Seoul, KR;

Suhyeon Kim, Seoul, KR;

Seong Yoon Kim, Seoul, KR;

Min Gyo Jeong, Seoul, KR;

Inkyun Shin, Seoul, KR;

Assignee:

SK enpulse Co., Ltd., Pyeongtaek-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/58 (2012.01); G03F 1/48 (2012.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/58 (2013.01); G03F 1/48 (2013.01); G03F 1/60 (2013.01);
Abstract

A blank mask includes a transparent substrate and a multilayer light shielding film disposed on the transparent substrate, the multilayer light shielding film including a transition metal and at least any one between oxygen and nitrogen, the multilayer light shielding film including a first light shielding film and a second light shielding film disposed on the first light shielding film, and the multilayer light shielding film having an EA (Edge side Area damaged) value of 2 nmor less.


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