The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Aug. 16, 2022
Applicant:

Luminamask Co., Ltd., Cheonan-si, KR;

Inventors:

Taewan Kim, Seoul, KR;

Geongon Lee, Seoul, KR;

Suk Young Choi, Seoul, KR;

Suhyeon Kim, Seoul, KR;

Sung Hoon Son, Seoul, KR;

Seong Yoon Kim, Seoul, KR;

Min Gyo Jeong, Seoul, KR;

Hahyeon Cho, Seoul, KR;

Inkyun Shin, Seoul, KR;

Hyung-Joo Lee, Seoul, KR;

Assignee:

LuminaMask Co., Ltd., Cheonan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/82 (2012.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); B08B 7/04 (2006.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); B08B 7/0042 (2013.01); B08B 7/0057 (2013.01); B08B 7/04 (2013.01); G03F 1/60 (2013.01);
Abstract

A method of cleaning a substrate for a blank mask including: a first cleaning including irradiating a cleaning target substrate with a pre-treatment light to prepare a substrate cleaned with light, and a second cleaning including applying a first cleaning solution and a post-treatment light to the substrate cleaned with light to prepare the substrate for the blank mask, is disclosed.


Find Patent Forward Citations

Quick Actions:

Kim, Taewan. (2026). Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the same (U.S. Patent No. 12782805). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12782805

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