Nirasaki, Japan

Gen You

USPTO Granted Patents = 17 

Average Co-Inventor Count = 5.5

ph-index = 3

Forward Citations = 473(Granted Patents)


Location History:

  • Yamanashi, JP (2017 - 2018)
  • Kumamoto, JP (2018 - 2019)
  • Nirasaki, JP (2011 - 2023)
  • Koshi, JP (2017 - 2023)

Company Filing History:


Years Active: 2011-2025

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17 patents (USPTO):Explore Patents

Title: Innovations by Gen You: A Visionary in Etching Technologies

Introduction

Gen You, an accomplished inventor based in Nirasaki, Japan, has made significant contributions to the field of etching technologies. With a remarkable portfolio of 17 patents, he has been instrumental in advancing the methods and apparatuses used in semiconductor processing. His innovative approaches have been pivotal in enhancing the efficiency and precision of etching techniques in various materials.

Latest Patents

Among his latest inventions, Gen You has developed an etching method that involves providing a substrate containing silicon and a molybdenum or tungsten film. This method selectively etches the molybdenum or tungsten film relative to the silicon by using an oxidation gas and hexafluoride gas within the chamber. This precision allows for improved control in the manufacturing process. Furthermore, he has introduced another innovative etching method where a substrate containing titanium nitride and molybdenum or tungsten is processed. In this method, a processing gas composed of ClF gas and N gas is utilized, with a specific partial pressure ratio that minimizes pitting through effective nitriding of the grain boundaries.

Career Highlights

Gen You's professional journey includes significant tenure at leading companies in the technology sector, notably Tokyo Electron Limited and Toshiba Memory Corporation. His work at these prestigious institutions has not only contributed to his personal growth as an inventor but also to the advancement of the field as a whole.

Collaborations

Throughout his career, Gen You has collaborated with several talented professionals, including notable coworkers like Kazuyuki Mitsuoka and Hiroki Ohno. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies and methodologies in etching processes.

Conclusion

Gen You remains a pivotal figure in the realm of etching technology. His contributions through innovative patents and collaboration with industry leaders highlight his dedication to pushing the boundaries of what is possible in semiconductor manufacturing. As the industry continues to evolve, Gen You's inventions will undoubtedly play a critical role in shaping its future.

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