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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10418242 B1

PDFFull Text
Date of Patent:
Sep. 17, 2019

Filed:

Sep. 15, 2015

Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Makoto Muramatsu, Koshi, JP;

Tadatoshi Tomita, Koshi, JP;

Hisashi Genjima, Koshi, JP;

Gen You, Koshi, JP;

Takahiro Kitano, Koshi, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Posz Law Group, PLC

Primary Examiner:

M A Golub-Miller

Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/033 (2006.01); G03F 7/40 (2006.01); H01L 21/31 (2006.01); C08J 7/18 (2006.01); D06M 14/18 (2006.01); G03D 5/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); G03F 7/00 (2006.01); H01J 37/32 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); C08J 7/18 (2013.01); D06M 14/18 (2013.01); G03D 5/003 (2013.01); G03F 7/0002 (2013.01); G03F 7/40 (2013.01); H01J 37/3255 (2013.01); H01J 37/32082 (2013.01); H01L 21/027 (2013.01); H01L 21/02043 (2013.01); H01L 21/0335 (2013.01); H01L 21/31 (2013.01); H01L 21/6719 (2013.01); H01L 21/67167 (2013.01); H01L 21/67173 (2013.01); H01L 21/67178 (2013.01); H01L 29/511 (2013.01); H01L 29/66545 (2013.01); H05H 1/46 (2013.01);
Abstract

A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.

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