Location History:
- Koshi, JP (2016 - 2023)
- Kumamoto, JP (2023)
Company Filing History:
Years Active: 2016-2023
Title: Hisashi Genjima: Innovator in Insulating Film Technology
Introduction
Hisashi Genjima is a distinguished inventor based in Koshi, Japan, renowned for his groundbreaking contributions to the field of insulating film technology. With a total of 8 patents to his name, Genjima has made significant advancements that enhance the quality and efficiency of substrate processing in the semiconductor industry.
Latest Patents
Hisashi Genjima's recent patents include a "Method for Forming Insulating Film," "Apparatus for Processing Substrate," and "System for Processing Substrate." These innovations describe a method that involves forming an insulating film containing silicon oxide by applying a coating solution with polysilazane onto a wafer. The technique emphasizes the volatilization of solvents, irradiation of the coating film with ultraviolet rays in a nitrogen atmosphere, and a subsequent curing process. This method significantly reduces the energy required for hydrolysis, enhances crosslinking rates, and results in a dense, high-quality insulation film. Additionally, a protective film forms on the coating's surface, suppressing reactions that can undermine film quality prior to curing.
Career Highlights
Hisashi Genjima currently works at Tokyo Electron Limited, a leading company in semiconductor production equipment. Throughout his career, he has focused on developing technologies that optimize the fabrication processes of semiconductor devices, ensuring improved performance and quality in the final products.
Collaborations
Genjima collaborates with other talented professionals, including Makoto Muramatsu and Tadatoshi Tomita. Their teamwork fosters innovation and drives the development of cutting-edge technologies in the field of substrate processing.
Conclusion
Hisashi Genjima's innovative work and numerous patents exemplify his dedication to advancing semiconductor technology. As he continues to refine methods for forming insulating films, his contributions are poised to significantly impact the industry, leading to better performance and efficiency in semiconductor manufacturing.