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For the Inventor, By the Inventor

Tokyo, Japan

Fujihiko Toyomasu

This inventor holds 15 USPTO granted patents and 1 published patent application. Top assignee: Ebara Corporation. Active years: 2002-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fujihiko Toyomasu. Retrieved from https://idiyas.com/inventor/fujihiko-toyomasu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 86.7

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Kanagawa, JP (2004)
  • Tokyo, JP (2002 - 2024)

Company Filing History:

goldMedal15 out of 2,576 
 
Ebara Corporation
 patents

Years Active: 2002-2025

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15 patents (USPTO):Explore Patents
1. 12447449 - Chemical supply apparatus, cleaning system, and chemical supply method (2025-10-21),
2. 12208428 - Liquid supplying device and method for draining liquid thereof (2025-01-28),
3. 12140980 - Apparatus for supplying liquid, cleaning unit, and apparatus for processing substrate (2024-11-12),
4. 12042901 - Cleaning liquid supply device, cleaning unit, and storage medium storing program (2024-07-23),
5. 11890652 - Cleaning chemical liquid supply device and cleaning chemical liquid supply method (2024-02-06),
6. 11358253 - Cleaning liquid supply device, cleaning unit, and storage medium storing program (2022-06-14),
7. 10926301 - Liquid supplying device and liquid supplying method (2021-02-23),
8. 10573509 - Cleaning apparatus and substrate processing apparatus (2020-02-25),
9. 10438818 - Substrate processing apparatus and pipe cleaning method for substrate processing apparatus (2019-10-08),
10. 10373845 - Substrate cleaning apparatus and substrate cleaning method (2019-08-06),
11. 10343192 - Liquid supplying device and liquid supplying method (2019-07-09),
12. 10340159 - Cleaning chemical supplying device, cleaning chemical supplying method, and cleaning unit (2019-07-02),
13. 6802762 - Method for supplying slurry to polishing apparatus (2004-10-12),
14. 6722953 - Abrasive liquid feed apparatus, method for feeding additive to abrasive liquid feed apparatus, and polishing apparatus (2004-04-20),
15. 6338671 - Apparatus for supplying polishing liquid (2002-01-15),

Title: Fujihiko Toyomasu: Innovator in Chemical Supply Technology

Introduction

Fujihiko Toyomasu is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical supply technology, holding a total of 15 patents. His work focuses on improving the efficiency and effectiveness of chemical supply systems.

Latest Patents

Among his latest patents are a chemical supply apparatus, a cleaning system, and a chemical supply method. The chemical supply apparatus is designed to supply a cleaning chemical to two nozzles while maintaining a set flow rate to one of them. This innovative system includes a first cleaning chemical supply pipe, a first mixer for generating the cleaning chemical, and a first supply controller that executes feedback control based on the flow rate. Another notable patent addresses the liquid supplying device and method for draining liquid, which enhances the liquid draining process by circulating an inert gas within the pipe without dividing it.

Career Highlights

Fujihiko Toyomasu is currently employed at Ebara Corporation, a company known for its advanced technology in fluid handling and environmental solutions. His work at Ebara has allowed him to develop and refine his innovative ideas in chemical supply systems.

Collaborations

He has collaborated with notable coworkers such as Junji Kunisawa and Toru Maruyama, contributing to the advancement of their shared projects and innovations.

Conclusion

Fujihiko Toyomasu's contributions to chemical supply technology exemplify his dedication to innovation and improvement in the field. His patents reflect a commitment to enhancing efficiency and functionality in chemical supply systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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