The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2019
Filed:
Mar. 17, 2015
Ebara Corporation, Tokyo, JP;
Junji Kunisawa, Tokyo, JP;
Toru Maruyama, Tokyo, JP;
Masayoshi Imai, Tokyo, JP;
Koji Maeda, Tokyo, JP;
Mitsuru Miyazaki, Tokyo, JP;
Teruaki Hombo, Tokyo, JP;
Fujihiko Toyomasu, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
The present invention relates to a substrate processing apparatus for processing a substrate, such as a wafer, while supplying a cleaning liquid (e.g. pure water and a liquid chemical) to the substrate, and also relates to a pipe cleaning method for the substrate processing apparatus. The substrate processing apparatus includes: a first cleaning lane including first cleaning units (), () each for cleaning a substrate while supplying pure water to the substrate; a second cleaning lane including second cleaning units (), () each for cleaning a substrate while supplying pure water to the substrate; a first pure-water supply pipe () for supplying the pure water to the first cleaning lane; and a second pure-water supply pipe () for supplying the pure water to the second cleaning lane.