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For the Inventor, By the Inventor

Tokyo, Japan

Masayoshi Imai

This inventor holds 9 USPTO granted patents and 1 published patent application. Top assignee: Ebara Corporation. Active years: 2017-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayoshi Imai. Retrieved from https://idiyas.com/inventor/masayoshi-imai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 100.0

Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal9 out of 2,576 
 
Ebara Corporation
 patents

Years Active: 2017-2025

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9 patents (USPTO):Explore Patents
1. 12463062 - Substrate processing apparatus, computer-readable storage medium storing a program, and substrate processing method (2025-11-04),
2. 11848216 - Cleaning apparatus for cleaning member, substrate cleaning apparatus and cleaning member assembly (2023-12-19),
3. 11495475 - Method of cleaning a substrate (2022-11-08),
4. 10985037 - Substrate cleaning apparatus, substrate cleaning method, and control method of substrate cleaning apparatus (2021-04-20),
5. 10607862 - Substrate cleaning apparatus (2020-03-31),
6. 10500691 - Substrate processing apparatus and substrate processing method (2019-12-10),
7. 10438818 - Substrate processing apparatus and pipe cleaning method for substrate processing apparatus (2019-10-08),
8. 10229841 - Wafer drying apparatus and wafer drying method (2019-03-12),
9. 9666455 - Substrate cleaning apparatus (2017-05-30),

Title: Masayoshi Imai: Innovator in Substrate Processing Technology

Introduction

Masayoshi Imai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 9 patents to his name, Imai has developed innovative solutions that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Imai's latest patents include a substrate processing apparatus, a computer-readable storage medium storing a program, and a substrate processing method. The substrate processing apparatus features a controller that rotates the substrate at varying speeds while supplying a dry fluid for optimal processing. Additionally, his cleaning apparatus for cleaning members includes a holding part, inner and outer cleaning liquid supply parts, and a control part that manages the cleaning processes effectively.

Career Highlights

Throughout his career, Imai has been associated with Ebara Corporation, where he has played a crucial role in advancing substrate processing technologies. His work has not only contributed to the company's success but has also set new standards in the industry.

Collaborations

Imai has collaborated with notable colleagues such as Mitsuru Miyazaki and Takeshi Iizumi. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Masayoshi Imai's contributions to substrate processing technology exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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