The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
May. 22, 2019
Applicant:
Ebara Corporation, Tokyo, JP;
Inventors:
Fujihiko Toyomasu, Tokyo, JP;
Junji Kunisawa, Tokyo, JP;
Assignee:
Ebara Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 37/00 (2006.01); G05D 11/13 (2006.01); B08B 3/08 (2006.01); G05D 7/06 (2006.01); H01L 21/67 (2006.01); B24B 37/00 (2012.01);
U.S. Cl.
CPC ...
B08B 3/08 (2013.01); B24B 37/00 (2013.01); F16K 37/0091 (2013.01); G05D 7/0635 (2013.01); G05D 11/132 (2013.01); H01L 21/6704 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01); F15B 2211/50554 (2013.01); F15B 2211/57 (2013.01); Y10T 137/7759 (2015.04); Y10T 137/7761 (2015.04);
Abstract
The present invention provides a liquid supplying device that can determine whether a CLC can be used appropriately. A liquid supplying device for supplying a liquid from a liquid source to a cleaning device is provided. The liquid supplying device includes a flow rate control device that measures a flow rate of a liquid from the liquid source and controls the flow rate based on the measured value, an IN-side pressure gauge provided between the liquid source and the flow rate control device and an OUT-side pressure gauge provided between the flow rate control device and the cleaning device.