The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

May. 09, 2022
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Haiyang Xu, Tokyo, JP;

Fujihiko Toyomasu, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/34 (2012.01); B08B 3/08 (2006.01); G01F 1/66 (2022.01); H01L 21/67 (2006.01); B08B 3/00 (2006.01); G01F 1/36 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
B24B 37/34 (2013.01); B08B 3/08 (2013.01); G01F 1/66 (2013.01); H01L 21/6704 (2013.01); B08B 3/00 (2013.01); G01F 1/36 (2013.01); H01L 21/30625 (2013.01);
Abstract

A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.


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