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For the Inventor, By the Inventor

Hsinchu, Taiwan

Fu-Jier Fan

USPTO Granted Patents = 48 

Average Co-Inventor Count = 6.1

ph-index = 11

Forward Citations = 403(Granted Patents)


Location History:

  • Jubei, KR (2003)
  • Hsinchu Hsien, TW (2008)
  • Jubei, TW (2002 - 2009)
  • Hsinchu, TW (2010 - 2023)

Company Filing History:

goldMedal48 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2002-2025

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48 patents (USPTO):Explore Patents
1. 12414361 - Method of manufacturing a semiconductor device (2025-09-09),
2. 12272686 - Semiconductor structure and manufacturing method of the same (2025-04-08),
3. 12100706 - Semiconductor structure and method of forming thereof (2024-09-24),
4. 11710712 - Semiconductor device and manufacturing method of the same (2023-07-25),
5. 11705449 - Through silicon via design for stacking integrated circuits (2023-07-18),
6. 11646308 - Through silicon via design for stacking integrated circuits (2023-05-09),
7. 11569363 - Dishing prevention dummy structures for semiconductor devices (2023-01-31),
8. 11417649 - Semiconductor device (2022-08-16),
9. 11410995 - Semiconductor structure and method of forming thereof (2022-08-09),
10. 11302691 - High voltage integration for HKMG technology (2022-04-12),
11. 11063038 - Through silicon via design for stacking integrated circuits (2021-07-13),
12. 11004844 - Recessed STI as the gate dielectric of HV device (2021-05-11),
13. 10964692 - Through silicon via design for stacking integrated circuits (2021-03-30),
14. 10950708 - Dishing prevention dummy structures for semiconductor devices (2021-03-16),
15. 10937891 - Spacer structure and manufacturing method thereof (2021-03-02),

Title: The Innovative Journey of Fu-Jier Fan

Introduction: Fu-Jier Fan, a pioneering inventor hailing from Hsinchu, Taiwan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Fu-Jier Fan holds several patents in the field of semiconductor technology, including a recent patent for a novel method of enhancing chip performance through advanced cooling techniques.

Career Highlights: With a career spanning over two decades, Fu-Jier Fan has worked for leading tech companies in Taiwan, honing his skills in research and development. He has been instrumental in developing cutting-edge technologies that have revolutionized the semiconductor industry.

Collaborations: Throughout his career, Fu-Jier Fan has collaborated with top researchers and engineers in the field, fostering a culture of innovation and excellence. His collaborative efforts have led to the successful development of several groundbreaking technologies.

Conclusion: Fu-Jier Fan's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a respected inventor in the global tech community. His contributions continue to inspire future generations of inventors and innovators.

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