The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2023

Filed:

Jun. 09, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Kong-Beng Thei, Pao-Shan Village, TW;

Dun-Nian Yaung, Taipei, TW;

Fu-Jier Fan, Hsinchu, TW;

Hsing-Chih Lin, Tainan, TW;

Hsiao-Chin Tuan, Taowan, TW;

Jen-Cheng Liu, Hsin-Chu, TW;

Alexander Kalnitsky, San Francisco, CA (US);

Yi-Sheng Chen, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 27/06 (2006.01); H01L 23/48 (2006.01); H01L 23/522 (2006.01); H01L 23/31 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0688 (2013.01); H01L 21/4857 (2013.01); H01L 23/3171 (2013.01); H01L 23/481 (2013.01); H01L 23/5226 (2013.01); H01L 23/562 (2013.01); H01L 24/03 (2013.01); H01L 24/06 (2013.01); H01L 24/89 (2013.01); H01L 2224/02372 (2013.01); H01L 2224/03916 (2013.01); H01L 2224/80001 (2013.01);
Abstract

A three-dimensional (3D) integrated circuit (IC) is provided. In some embodiments, a second IC die is bonded to a first IC die. The first IC die includes a first semiconductor substrate and a first interconnect structure over the first semiconductor substrate. The second IC die includes a second semiconductor substrate and a second interconnect structure over the second semiconductor substrate. A plurality of electrical coupling structures is arranged at the peripheral region of the first semiconductor device and the second semiconductor device. The plurality of electrical coupling structures respectively comprises a through silicon via (TSV) disposed in the second semiconductor substrate and electrically coupled to the first semiconductor device through a stack of wiring layers and inter-wire vias.


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