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For the Inventor, By the Inventor

Lake Oswego, OR, United States of America

Fayaz A Shaikh

USPTO Granted Patents = 15 

Average Co-Inventor Count = 2.2

ph-index = 4

Forward Citations = 42(Granted Patents)


Location History:

  • Lake Oswego, OR (US) (2018 - 2023)
  • Portland, OR (US) (2016 - 2024)

Company Filing History:

goldMedal15 out of 3,768 
 
Lam Research Corporation
 patents

Years Active: 2016-2025

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15 patents (USPTO):
1. 12338531 - Spatially tunable deposition to compensate within wafer differential bow (2025-06-24),
2. 12300489 - UV cure for local stress modulation (2025-05-13),
3. 11946142 - Spatially tunable deposition to compensate within wafer differential bow (2024-04-02),
4. 11851760 - PECVD deposition system for deposition on selective side of the substrate (2023-12-26),
5. 11725283 - PECVD deposition system for deposition on selective side of the substrate (2023-08-15),
6. 11674226 - Separation of plasma suppression and wafer edge to improve edge film thickness uniformity (2023-06-13),
7. 11441222 - PECVD deposition system for deposition on selective side of the substrate (2022-09-13),
8. 10903070 - Asymmetric wafer bow compensation by chemical vapor deposition (2021-01-26),
9. 10851457 - PECVD deposition system for deposition on selective side of the substrate (2020-12-01),
10. 10388485 - Inter-electrode gap variation methods for compensating deposition non-uniformity (2019-08-20),
11. 10096475 - System and method for depositing a homogenous interface for PECVD metal-doped carbon hardmasks (2018-10-09),
12. 9928994 - Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask films (2018-03-27),
13. 9875890 - Deposition of metal dielectric film for hardmasks (2018-01-23),
14. 9859088 - Inter-electrode gap variation methods for compensating deposition non-uniformity (2018-01-02),
15. 9520295 - Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems (2016-12-13),

Title: The Innovative Contributions of Fayaz A. Shaikh

Introduction

Fayaz A. Shaikh is a prominent inventor based in Lake Oswego, Oregon. He has made significant contributions to the field of semiconductor processing, holding a total of 15 patents. His work focuses on enhancing the efficiency and effectiveness of film deposition techniques in semiconductor manufacturing.

Latest Patents

Shaikh's latest patents include groundbreaking technologies such as "Spatially tunable deposition to compensate within wafer differential bow." This invention involves a plasma processing chamber designed for depositing a film on the underside surface of a wafer. The chamber features a showerhead pedestal with two zones, each configured for depositing different films. Another notable patent is "UV cure for local stress modulation." This technology allows for the modulation of localized stresses in a film deposited on a bowed semiconductor substrate by using ultraviolet (UV) radiation. The method includes a mask that selectively defines exposed and non-exposed regions of the UV-curable film, effectively mitigating bowing in the substrate.

Career Highlights

Fayaz A. Shaikh is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His innovative work has positioned him as a key figure in the industry, contributing to advancements that improve manufacturing processes.

Collaborations

Throughout his career, Shaikh has collaborated with talented individuals such as Nick Linebarger and Curtis Warren Bailey. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Fayaz A. Shaikh's contributions to semiconductor processing through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to shape the future of semiconductor manufacturing, making significant strides in technology and innovation.

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