Chungcheongnam-do, South Korea

Eui Hyun Ryu

USPTO Granted Patents = 6 

Average Co-Inventor Count = 6.0

ph-index = 1


Location History:

  • Gyeonggi-do, KR (2019 - 2022)
  • Chungcheongnam-Do, KR (2020 - 2022)

Company Filing History:


Years Active: 2019-2022

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6 patents (USPTO):Explore Patents

Title: Eui Hyun Ryu: Innovator in Polymer Chemistry

Introduction

Eui Hyun Ryu is a prominent inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of polymer chemistry, particularly in the development of advanced materials for electronic applications. With a total of 6 patents to his name, Ryu's work has had a substantial impact on the industry.

Latest Patents

Ryu's latest patents focus on monomers, polymers, and photoresist compositions. One of his notable inventions includes monomers and polymers that comprise a carbon alicyclic group or heteroalicyclic group. These compositions feature one or more acid-labile ring substituents and ether or thioether ring substituents. Additionally, he has developed photoresists that incorporate such polymers, enhancing their performance in various applications. Another patent presents polymers with a specific structure, further advancing the capabilities of photoresists in the industry.

Career Highlights

Throughout his career, Eui Hyun Ryu has worked with leading companies in the field. He has been associated with Rohm and Haas Electronic Materials Korea Ltd. and Rohm & Haas Electronic Materials LLC. His experience in these organizations has allowed him to refine his expertise and contribute to innovative projects.

Collaborations

Ryu has collaborated with several talented individuals in his field. Notable coworkers include Jae Hwan Sim and Min Kyung Jang, who have worked alongside him on various projects, further enhancing the quality and impact of their collective work.

Conclusion

Eui Hyun Ryu is a distinguished inventor whose contributions to polymer chemistry and electronic materials have made a lasting impact. His innovative patents and collaborations reflect his commitment to advancing technology in his field.

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