The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Aug. 31, 2016
Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Chungcheongnam-Do, KR;

Inventors:

Eui Hyun Ryu, Chungcheongnam-Do, KR;

Min Kyung Jang, Chungcheongnam- do, KR;

Jung Woo Kim, Chungcheongnam-Do, KR;

Kwang-Mo Choi, Chungcheongnam-Do, KR;

Hyun Jeon, Chungcheongnam-Do, KR;

Woo-Hyung Lee, Chungcheongnam-Do, KR;

Myung-Yeol Kim, Chungcheongnam-Do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/38 (2006.01); C08F 218/14 (2006.01); C08F 220/28 (2006.01); C07C 69/54 (2006.01); C07C 69/21 (2006.01); C07C 69/63 (2006.01); G03F 7/11 (2006.01); G03F 7/004 (2006.01); C07C 69/653 (2006.01); G03F 7/038 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C07C 69/21 (2013.01); C07C 69/54 (2013.01); C07C 69/63 (2013.01); C07C 69/653 (2013.01); C08F 218/14 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0397 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2041 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); C08F 220/283 (2020.02);
Abstract

In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.


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