Woo-Hyung Lee

Title: Woo-Hyung Lee: Innovator in Monomers and Photoresist Compositions

Introduction

Woo-Hyung Lee is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of materials science, particularly in the development of monomers, polymers, and photoresist compositions. With a total of 2 patents to his name, Lee's work is recognized for its innovative approach and practical applications.

Latest Patents

Lee's latest patents focus on the creation of monomers and polymers that include a carbon alicyclic group or heteroalicyclic group. These compositions feature one or more acid-labile ring substituents and ether or thioether ring substituents. Additionally, he has developed photoresists that incorporate such polymers, enhancing their functionality and effectiveness in various applications. In one of his preferred embodiments, he provides polymers that comprise a specific structure, further advancing the field of photoresist technology.

Career Highlights

Woo-Hyung Lee is currently employed at Rohm and Haas Electronic Materials Korea Ltd. His role at the company allows him to apply his expertise in materials science to real-world challenges. Lee's innovative work has positioned him as a key figure in the development of advanced materials for electronic applications.

Collaborations

Lee has collaborated with esteemed colleagues, including Eui Hyun Ryu and Myung-Yeol Kim. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in their field.

Conclusion

Woo-Hyung Lee's contributions to the field of materials science, particularly in monomers and photoresist compositions, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.