The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2022
Filed:
Dec. 29, 2017
Applicant:
Rohm and Haas Electronic Materials Korea Ltd., Chungcheongnam-do, KR;
Inventors:
Eui Hyun Ryu, Chungcheongnam-Do, KR;
Myung-Yeol Kim, Chungcheongnam-Do, KR;
Woo-Hyung Lee, Chungcheongnam-Do, KR;
Haemi Jeong, Chungcheongnam-do, KR;
Kwang-Hwyi Im, Chungcheongnam-do, KR;
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/38 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); C08F 220/68 (2006.01); G03F 7/038 (2006.01); C07C 323/13 (2006.01); C07C 69/54 (2006.01); C08L 33/10 (2006.01); C07D 327/06 (2006.01); C07D 331/00 (2006.01); C07D 327/00 (2006.01); C07D 335/02 (2006.01); C09D 133/06 (2006.01); C07D 307/20 (2006.01); C07C 323/17 (2006.01); C07D 309/10 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0384 (2013.01); C07C 69/54 (2013.01); C07C 323/13 (2013.01); C07C 323/17 (2013.01); C07D 307/20 (2013.01); C07D 309/10 (2013.01); C07D 327/00 (2013.01); C07D 327/06 (2013.01); C07D 331/00 (2013.01); C07D 335/02 (2013.01); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/285 (2020.02); C08F 220/38 (2013.01); C08F 220/382 (2020.02); C08F 220/68 (2013.01); C08L 33/10 (2013.01); C09D 133/06 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/38 (2013.01); C07C 2601/14 (2017.05);
Abstract
Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.