The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

May. 12, 2016
Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Cheonan, Chungcheongnam-Do, KR;

Inventors:

Min-Kyung Jang, Seoul, KR;

Eui Hyun Ryu, Gyeonggi-do, KR;

Chang-Young Hong, Chungbuk, KR;

Myung Yeol Kim, Gyeonggi-do, KR;

Jung-June Lee, Ghungcheongnam-do, KR;

Dong Je Hong, Gyeonggi-do, KR;

Dong-Yong Kim, Gyeonggi-do, KR;

Hae-Jin Lim, Yonsu-Gu, KR;

Jae Yun Ahn, Busan, KR;

Ohk-Min Jeon, Chungcheongnam-do, KR;

Assignee:

Rohm and Haas Electronic Materials Korea Ltd., Cheonan, Chungcheongnam-do, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); C07C 271/12 (2006.01); C07C 271/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 271/12 (2013.01); C07C 271/14 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); C07C 2603/14 (2017.05);
Abstract

New photobase generators suitable for use in photoresists are provided that correspond to Formula (I):X—R—O—C(═O)N(R)R  (I)wherein Xis an optionally substituted aromatic group; Ris a linker; and Rand Rare the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of Rand Ris an optionally substituted branched alkyl group having 4 or more carbon atoms.


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