Albany, NY, United States of America

Eric Chih-Fang Liu

This inventor holds 33 USPTO granted patents and 25 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Tokyo Electron Limited. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eric Chih-Fang Liu. Retrieved from https://idiyas.com/inventor/eric-chih-fang-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 33 

% Patents Active = 84.8

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 8(Granted Patents)


Location History:

  • Guilderland, NY (US) (2018 - 2021)
  • Albany, NY (US) (2019 - 2024)

Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
Patterning
Semiconductor
Etching Processes
Defect Reduction
Substrate Processing
Multi-Patterning
Lithography
Atomic Layer Deposition
Chemical Mechanical Polishing
FinFET
Dielectric Layer
EUV Inverse Patterning
33 patents (USPTO):Explore Patents

Title: The Inventor Profile of Eric Chih-Fang Liu

Introduction: Eric Chih-Fang Liu is a renowned inventor based in Albany, NY, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Eric Chih-Fang Liu holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a background in engineering and a passion for problem-solving, Eric Chih-Fang Liu has led numerous successful projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Eric Chih-Fang Liu has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life and make a positive impact on society.

Conclusion: Eric Chih-Fang Liu's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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