The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Mar. 13, 2024
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Yen-Tien Lu, Albany, NY (US);
Eric Chih-Fang Liu, Albany, NY (US);
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 50/00 (2026.01); H10P 76/20 (2026.01);
U.S. Cl.
CPC ...
H10P 50/695 (2026.01); H10P 50/692 (2026.01); H10P 76/2041 (2026.01);
Abstract
A method for processing a substrate includes forming a first mask over a mask line and forming a patterned mask by patterning a mask layer using the first mask as an etch mask. The first mask extending over sidewalls of the mask line and the mask layer is under the mask line. The method further includes forming a pillar and a line under the pillar from a target layer with an etch process by using the patterned mask layer as another etch mask.