Yen-Tien Lu

This inventor holds 14 USPTO granted patents and 11 published patent applications, primarily in Atomic Layer Deposition. Top assignee: Tokyo Electron Limited. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yen-Tien Lu. Retrieved from https://idiyas.com/inventor/yen-tien-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14 (Patent Applications = 11)

% Patents Active = 71.4

Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 9(Granted Patents)

Location History:

Hillsboro, OR (US) (2022)
Albany, NY (US) (2021 - 2023)

Company Filing History:

14 out of 10,947

Tokyo Electron Limited

patents

Years Active: 2021-2026

Loading Chart...

Areas of Expertise:

Atomic Layer Deposition

Etch Profile Control

Conductive Materials

Substrate Processing

High Aspect Ratio

Dielectric Layer

Low-K Layers

Metal Hard Mask

Via Formation

Plasma Etching

Patterning

Ruthenium Metal

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12765297 - Protection layer formation during plasma etching conductive materials (2026-10-13),

2. 12727414 - Method for processing a substrate (2026-09-01),

3. 12648386 - Method of deposition in high aspect ratio (HAR) features (2026-06-02),

4. 12598932 - Methods and structures for improving etch profile of underlying layers (2026-04-07),

5. 11756790 - Method for patterning a dielectric layer (2023-09-12),

6. 11742241 - ALD (atomic layer deposition) liner for via profile control and related applications (2023-08-29),

7. 11721578 - Split ash processes for via formation to suppress damage to low-K layers (2023-08-08),

8. 11688604 - Method for using ultra thin ruthenium metal hard mask for etching profile control (2023-06-27),

9. 11515203 - Selective deposition of conductive cap for fully-aligned-via (FAV) (2022-11-29),

10. 11289325 - Radiation of substrates during processing and systems thereof (2022-03-29),

11. 11164781 - ALD (atomic layer deposition) liner for via profile control and related applications (2021-11-02),

12. 11121027 - High aspect ratio via etch using atomic layer deposition protection layer (2021-09-14),

13. 10964587 - Atomic layer deposition for low-K trench protection during etch (2021-03-30),

14. 10950444 - Metal hard mask layers for processing of microelectronic workpieces (2021-03-16),

Title: The Innovative Journey of Yen-Tien Lu

Introduction: Yen-Tien Lu, a pioneering inventor based in Albany, NY, has made significant contributions to the field of technology with her groundbreaking innovations.

Latest Patents: Yen-Tien Lu holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing her diverse range of expertise and creativity.

Career Highlights: With a career spanning over two decades, Yen-Tien Lu has worked with leading research institutions and tech companies, consistently pushing the boundaries of what is possible in the world of inventions.

Collaborations: Throughout her career, Yen-Tien Lu has collaborated with top scientists, engineers, and designers, fostering a culture of innovation and excellence in all her projects.

Conclusion: Yen-Tien Lu's passion for innovation and her relentless drive to create a better future through her inventions make her a true trailblazer in the world of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

11 patents pending: