The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Sep. 05, 2023
Tokyo Electron Limited, Tokyo, JP;
Eric Chih-Fang Liu, Albany, NY (US);
Sophie Thibaut, Albany, NY (US);
Nicholas Joy, Albany, NY (US);
Christopher Cole, Albany, NY (US);
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method for processing a substrate includes forming a first hardmask layer over a target layer and a second hardmask layer over the first hardmask layer, and patterning the second hardmask layer. The method further includes forming a tone inversion mask between portions of the patterned second hardmask layer, removing the patterned second hardmask layer, patterning the first hardmask layer using the tone inversion mask as an etching mask, and etching the target layer using the patterned first hardmask layer as another etching mask.