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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Effiong Etukudo Ibok

This inventor holds 61 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Technology (CPC class H01L). Top assignees: Advanced Micro Devices Corporation, The Travis Business Group, Inc., Other. Active years: 1990-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Effiong Etukudo Ibok. Retrieved from https://idiyas.com/inventor/effiong-etukudo-ibok

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 61 

% Patents Active = 98.4

Average Co-Inventor Count = 1.8

ph-index = 16

Forward Citations = 1,022(Granted Patents)

Forward Citations (Not Self Cited) = 1,018(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Austin, TX (US) (1990 - 1998)
  • Sunnyvale, CA (US) (1999 - 2011)

Company Filing History:

goldMedal59 out of 13,175 
 
Advanced Micro Devices Corporation
 patents
silverMedal1 out of 1 
 
The Travis Business Group, Inc.
 patent
bronzeMedal1 out of 834,570 
Other
 patents

Years Active: 1990-2011

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Areas of Expertise:
High-K Dielectrics
Shallow Trench Isolation
Dual Bit Flash Memory
MOSFET Processing
Polysilicon Deposition
Capacitance-Voltage Measurements
Gate Insulator
Indium Doping
Damascene Gate Formation
Spacer Technology
Isolation Regions
Ultra-Thin Gate Structures
61 patents (USPTO):Explore Patents
1. 8045314 - Method of atmospheric discharge energy conversion, storage and distribution (2011-10-25),
2. 6800568 - Methods for the deposition of high-K films and high-K films produced thereby (2004-10-05),
3. 6762454 - Stacked polysilicon layer for boron penetration inhibition (2004-07-13),
4. 6735123 - High density dual bit flash memory cell with non planar structure (2004-05-11),
5. 6693004 - Interfacial barrier layer in semiconductor devices with high-K gate dielectric material (2004-02-17),
6. 6630383 - Bi-layer floating gate for improved work function between floating gate and a high-K dielectric layer (2003-10-07),
7. 6599810 - Shallow trench isolation formation with ion implantation (2003-07-29),
8. 6593637 - Method for establishing component isolation regions in SOI semiconductor device (2003-07-15),
9. 6472283 - MOS transistor processing utilizing UV-nitride removable spacer and HF etch (2002-10-29),
10. 6472233 - MOSFET test structure for capacitance-voltage measurements (2002-10-29),
11. 6451641 - Non-reducing process for deposition of polysilicon gate electrode over high-K gate dielectric material (2002-09-17),
12. 6444555 - Method for establishing ultra-thin gate insulator using anneal in ammonia (2002-09-03),
13. 6429083 - Removable spacer technology using ion implantation to augment etch rate differences of spacer materials (2002-08-06),
14. 6417041 - Method for fabricating high permitivity dielectric stacks having low buffer oxide (2002-07-09),
15. 6399519 - Method for establishing ultra-thin gate insulator having annealed oxide and oxidized nitride (2002-06-04),

Title: Effiong Etukudo Ibok: Pioneering Innovator in Atmospheric Energy Conversion and Semiconductor Technology

Introduction: Effiong Etukudo Ibok, based in Sunnyvale, CA, is a prolific inventor with a passion for pushing the boundaries of technology. With an impressive portfolio of 61 patents, he continues to inspire the next generation of inventors with his innovative solutions.

Latest Patents:

1. Method of atmospheric discharge energy conversion, storage, and distribution: Effiong's groundbreaking invention focuses on converting atmospheric electrical discharge into usable energy. This method revolutionizes energy generation in isolated locations, offering significant cost advantages over traditional sources like fossil fuels and solar power.

2. Methods for the deposition of high-K films: Ibok's contribution to semiconductor technology includes an innovative process for fabricating high-K layers. This approach enhances the performance of semiconductor devices, showcasing his expertise in cutting-edge materials science.

Career Highlights: Effiong Etukudo Ibok has made significant contributions during his tenure at companies like Advanced Micro Devices Corporation and The Travis Business Group, Inc. His work highlights a commitment to innovation and pushing the boundaries of technology in various industries.

Collaborations: Throughout his career, Ibok has collaborated with industry experts such as Olov B Karlsson and Nick Kepler. These collaborations have led to the development of pioneering technologies and enriched the innovative landscape in which Effiong operates.

Conclusion: Effiong Etukudo Ibok's dedication to innovation and excellence shines through in his impressive patent portfolio and collaborative efforts. His work in atmospheric energy conversion and semiconductor technology underscores his status as a pioneering inventor, shaping the future of technology in profound ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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