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For the Inventor, By the Inventor

Union City, CA, United States of America

Dengliang Yang

This inventor holds 15 USPTO granted patents and 3 published patent applications, primarily in Plasma Etching Technology. Top assignees: Lam Research Corporation, Novellus Systems Incorporated, University of California. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dengliang Yang. Retrieved from https://idiyas.com/inventor/dengliang-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15 

% Patents Active = 80.0

Average Co-Inventor Count = 4.8

ph-index = 4

Forward Citations = 185(Granted Patents)


Company Filing History:

goldMedal13 out of 3,955 
 
Lam Research Corporation
 patents
silverMedal1 out of 993 
 
Novellus Systems Incorporated
 patents
bronzeMedal1 out of 16,048 
 
University of California
 patents

Years Active: 2013-2026

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Areas of Expertise:
Plasma Etching
FinFET Devices
Selective Etching
Chemical Sensors
Nitride Etch
Polysilicon Etch
Tungsten Etching
Oxygen Detection
Substrate Processing
Hardmask Planarization
Air Gap Spacer
Electron Density
15 patents (USPTO):Explore Patents
1. 12610773 - Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead (2026-04-21),
2. 12272571 - Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead (2025-04-08),
3. 12272570 - Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead (2025-04-08),
4. 12211709 - Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead (2025-01-28),
5. 11694911 - Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead (2023-07-04),
6. 11469079 - Ultrahigh selective nitride etch to form FinFET devices (2022-10-11),
7. 10727089 - Systems and methods for selectively etching film (2020-07-28),
8. 10283615 - Ultrahigh selective polysilicon etch with high throughput (2019-05-07),
9. 10267728 - Systems and methods for detecting oxygen in-situ in a substrate area of a substrate processing system (2019-04-23),
10. 10192751 - Systems and methods for ultrahigh selective nitride etch (2019-01-29),
11. 10147588 - System and method for increasing electron density levels in a plasma of a substrate processing system (2018-12-04),
12. 9837286 - Systems and methods for selectively etching tungsten in a downstream reactor (2017-12-05),
13. 9640409 - Self-limited planarization of hardmask (2017-05-02),
14. 9515156 - Air gap spacer integration for improved fin device performance (2016-12-06),
15. 8384409 - Ultra-thin organic TFT chemical sensor, making thereof, and sensing method (2013-02-26),

Title: Innovations of Dengliang Yang

Introduction

Dengliang Yang is a prominent inventor based in Union City, CA (US). He has made significant contributions to the field of substrate processing systems, holding a total of 15 patents. His work focuses on advanced gas distribution devices and methods that enhance processing efficiency.

Latest Patents

One of his latest patents is titled "Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead." This patent presents several designs of a gas distribution device for a substrate processing system, which includes a dual plenum showerhead. Additionally, it provides designs for a light blocking structure used with the showerheads, further improving the functionality of the system.

Career Highlights

Dengliang Yang has worked with notable organizations such as Lam Research Corporation and the University of California. His experience in these institutions has allowed him to develop innovative solutions that address complex challenges in substrate processing.

Collaborations

Some of his notable coworkers include Joon Hong Park and Haoquan Fang. Their collaborative efforts have contributed to the advancement of technologies in their respective fields.

Conclusion

Dengliang Yang's innovative work and numerous patents reflect his dedication to advancing substrate processing technologies. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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