The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Apr. 09, 2024
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Dengliang Yang, Union City, CA (US);
Haoquan Fang, Sunnyvale, CA (US);
David Cheung, Foster City, CA (US);
Gnanamani Amburose, Fremont, CA (US);
Eunsuk Ko, San Jose, CA (US);
Wei Yi Luo, Fremont, CA (US);
Dan Zhang, Fremont, CA (US);
Assignee:
LAM RESEARCH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/311 (2006.01); B08B 5/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); H01J 37/32146 (2013.01); H01J 37/32422 (2013.01); H01J 37/32449 (2013.01); H01J 37/32623 (2013.01); H01J 37/32724 (2013.01); H01J 37/32972 (2013.01); H01J 37/3299 (2013.01); H01L 21/31138 (2013.01); B08B 5/023 (2013.01); H01J 37/321 (2013.01); H01J 2237/334 (2013.01);
Abstract
Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, designs for a light blocking structure used with the showerheads are also provided.