Fremont, CA, United States of America

Wei Yi Luo

USPTO Granted Patents = 3 

Average Co-Inventor Count = 5.6

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):

Title: Innovations of Wei Yi Luo: A Leader in Substrate Processing Technologies

Introduction

Wei Yi Luo, an innovative inventor based in Fremont, CA, has made significant contributions to the field of substrate processing technologies. With a remarkable portfolio of three patents, he has played a vital role in advancing methods and systems that improve efficiency and effectiveness in manufacturing processes.

Latest Patents

Wei Yi Luo's latest patents include groundbreaking work on systems and methods for metastable activated radical selective strip and etch using a dual plenum showerhead. His designs enhance gas distribution devices for substrate processing systems, showcasing the integration of advanced engineering with practical applications. These devices feature innovative designs, including a dual plenum showerhead and a unique light-blocking structure that complements the showerheads.

Career Highlights

Wei Yi Luo is currently employed at Lam Research Corporation, a prominent player in the semiconductor manufacturing equipment industry. His role encompasses the development of technologies that streamline substrate processing, contributing to the efficiency of various manufacturing processes within the company.

Collaborations

Throughout his career, Wei Yi Luo has collaborated with talented colleagues, including Dengliang Yang and Haoquan Fang. These partnerships have fostered an environment of innovation and have played a critical role in the success of their projects in substrate processing technologies.

Conclusion

Wei Yi Luo stands out as a leading inventor in the field of substrate processing and gas distribution technologies. His contributions have been instrumental in developing advanced solutions that cater to the evolving needs of the industry. As he continues his journey at Lam Research Corporation, the impact of his work is certain to resonate within the realm of semiconductor manufacturing for years to come.

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