Dan Zhang

Title: The Innovative Contributions of Dan Zhang

Introduction

Dan Zhang, an accomplished inventor based in Fremont, CA, has made significant contributions to the field of substrate processing systems. With a portfolio of nine patents, his work reflects a deep commitment to innovation and technology development.

Latest Patents

Among his most recent patents is a substrate processing system that incorporates a dual ion filter for downstream plasma. This innovative design features upper and lower chambers, with the dual ion filter placed strategically between them. The upper filter is equipped with a first plurality of through holes designed to filter ions from the plasma in the upper chamber, while the lower filter controls plasma uniformity with a second plurality of through holes. Notably, the diameter of the upper filter holes is smaller than that of the lower filter, with the former having a greater number of holes.

Another patent details systems and methods for metastable activated radical selective strip and etch using a dual plenum showerhead. This invention includes several designs of a gas distribution device, showcasing Zhang's expertise in designing light-blocking structures used in conjunction with showerheads.

Career Highlights

Dan Zhang has held positions at renowned companies such as Lam Research Corporation and Applied Materials, Inc. His tenure at these leading firms has allowed him to develop and refine his innovative ideas, contributing to advancements in substrate processing technology.

Collaborations

Throughout his career, Zhang has collaborated with notable professionals like Gnanamani Amburose and Dengliang Yang. These partnerships have facilitated the exchange of ideas and fostered an environment of creativity and innovation in the projects they have undertaken.

Conclusion

Dan Zhang's contributions to the field of substrate processing systems and his impressive portfolio of patents highlight his role as a leading inventor in this industry. His innovative designs not only enhance the functionality of substrate systems but also contribute to the advancement of technology as a whole.