The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Jan. 21, 2020
Lam Research Corporation, Fremont, CA (US);
Andrew Stratton Bravo, Piedmont, CA (US);
Chih-Hsun Hsu, Cupertino, CA (US);
Serge Kosche, San Francisco, CA (US);
Stephen Whitten, Danville, CA (US);
Shih-Chung Kon, Fremont, CA (US);
Mark Kawaguchi, San Carlos, CA (US);
Himanshu Chokshi, Fremont, CA (US);
Dan Zhang, Fremont, CA (US);
Gnanamani Amburose, Fremont, CA (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A substrate processing system includes an upper chamber and a gas delivery system to supply a gas mixture to the upper chamber. An RF generator generates plasma in the upper chamber. A lower chamber includes a substrate support. A dual ion filter is arranged between the upper chamber and the lower chamber. The dual ion filter includes an upper filter including a first plurality of through holes configured to filter ions. A lower filter includes a second plurality of through holes configured to control plasma uniformity.