Himanshu Chokshi

Title: Himanshu Chokshi: Innovator in Substrate Processing Systems

Introduction

Himanshu Chokshi is a notable inventor based in Fremont, California, recognized for his contributions to substrate processing systems. With a total of eight patents to his name, Chokshi has made significant advancements in the field of plasma technology.

Latest Patents

Chokshi's latest patents include a substrate processing system featuring a dual ion filter for downstream plasma. This innovative design incorporates upper and lower filters, where the upper filter is equipped with a first plurality of through holes to filter ions from the plasma in the upper chamber. The lower filter, on the other hand, includes a second plurality of through holes that control plasma uniformity in the lower chamber. Notably, the diameter of the first plurality of through holes is less than that of the second plurality, and the number of holes in the upper filter exceeds that in the lower filter. Another significant patent addresses RF power compensation to mitigate deposition or etch rate changes due to variations in substrate bulk resistivity. This system includes a plasma generator that supplies RF power to an electrode in a processing chamber, with a sensor that detects parameters of the RF power. The controller compensates for variations in plasma processing rates based on the sensed parameters.

Career Highlights

Throughout his career, Chokshi has worked with prominent companies in the semiconductor industry, including Lam Research Corporation and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Chokshi has collaborated with notable colleagues such as Ben Ju and Eric J Hilton, further enhancing his innovative work in the field.

Conclusion

Himanshu Chokshi's contributions to substrate processing systems and his innovative patents underscore his role as a leading inventor in the semiconductor industry. His work continues to influence advancements in plasma technology and processing systems.