Shih-Chung Kon

Title: Inventor Shih-Chung Kon: A Pioneer in Substrate Processing Technology

Introduction

Shih-Chung Kon is a notable inventor based in San Jose, California, who has made significant contributions to the field of substrate processing. With a total of 6 patents to his name, his innovative work focuses primarily on improving plasma technology and processing systems.

Latest Patents

Among his latest patents is the "Substrate processing system including dual ion filter for downstream plasma." This patent describes a dual ion filter positioned between the upper and lower chambers of a substrate processing system, enhancing the efficiency of ion filtering. The upper filter contains a first plurality of through holes designed to filter ions from the plasma in the upper chamber, while the lower filter features a second plurality of through holes aimed at maintaining plasma uniformity in the lower chamber. Notably, the diameter of the holes in the upper filter is less than that of those in the lower filter, with a greater number of holes in the upper filter than in the lower.

Another significant patent details a substrate processing system that includes an upper chamber equipped with a gas delivery system to supply a gas mixture. An RF generator is responsible for generating plasma in the upper chamber, while a lower chamber houses the substrate support. Like his previous invention, this system also incorporates a dual ion filter for improved processing capabilities.

Career Highlights

Shih-Chung Kon has had a distinguished career, prominently working with Lam Research Corporation and Lam Research Group. His tenure at these renowned companies has provided him with extensive experience in the semiconductor industry, where his inventions continue to have a lasting impact.

Collaborations

Throughout his career, Kon has collaborated with notable coworkers, including Grant Peng and David S. L. Mui. Working alongside such esteemed professionals has fostered a creative environment that has likely contributed to his numerous patents and advancements in technology.

Conclusion

Shih-Chung Kon's innovative spirit and commitment to excellence in substrate processing have established him as a key figure in the industry. With multiple patents to his name, his work not only advances technology but also inspires future innovators in the field.