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Mark Naoshi Kawaguchi

This inventor holds 30 USPTO granted patents and 16 published patent applications, primarily in Semiconductor Processing. Top assignees: Lam Research Corporation, Applied Materials, Inc.. Active years: 2004-2026.

USPTO Granted Patents = 30 (Patent Applications = 16)

% Patents Active = 70.0

Average Co-Inventor Count = 4.6

ph-index = 7

Forward Citations = 822(Granted Patents)

Location History:

San Jose, CA (US) (2004)
Palo Alto, CA (US) (2004 - 2009)
Mountain View, CA (US) (2008 - 2010)
Sunnyvale, CA (US) (2010 - 2017)
San Carlos, CA (US) (2019 - 2024)

Company Filing History:

20 out of 3,940

Lam Research Corporation

patents

10 out of 14,433

Applied Materials, Inc.

patents

Years Active: 2004-2026

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Areas of Expertise:

Silicon Trim

Vapor Cleaning

Substrate Processing

High Aspect Ratio

Etching

FinFET Devices

Particle Removal

Halogen Residues

Photoresist Removal

Cyclic Passivation

Wafer Stress Monitoring

Dielectric Layer

30 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12757675 - Rapid and precise temperature control for thermal etching (2026-10-06),

2. 12568781 - Selective silicon trim by thermal etching (2026-03-03),

3. 12467147 - Vapor cleaning of substrate surfaces (2025-11-11),

4. 12347650 - Substrate processing system including dual ion filter for downstream plasma (2025-07-01),

5. 12080592 - Film stack simplification for high aspect ratio patterning and vertical scaling (2024-09-03),

6. 12040193 - Efficient cleaning and etching of high aspect ratio structures (2024-07-16),

7. 11967486 - Substrate processing system including dual ion filter for downstream plasma (2024-04-23),

8. 11488831 - Efficient cleaning and etching of high aspect ratio structures (2022-11-01),

9. 11469079 - Ultrahigh selective nitride etch to form FinFET devices (2022-10-11),

10. 11065654 - In situ vapor deposition polymerization to form polymers as precursors to viscoelastic fluids for particle removal from substrates (2021-07-20),

11. 11062897 - Metal doped carbon based hard mask removal in semiconductor fabrication (2021-07-13),

12. 11011388 - Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching (2021-05-18),

13. 10276398 - High aspect ratio selective lateral etch using cyclic passivation and etching (2019-04-30),

14. 9735002 - Integrated apparatus for efficient removal of halogen residues from etched substrates (2017-08-15),

15. 9159593 - Method of particle contaminant removal (2015-10-13),

Title: The Innovative Journey of Mark Naoshi Kawaguchi

Introduction: Mark Naoshi Kawaguchi is a renowned inventor based in Sunnyvale, CA (US) known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Mark Naoshi Kawaguchi holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Kawaguchi has worked with leading tech companies, spearheading research and development projects that have resulted in cutting-edge inventions that have revolutionized the industry.

Collaborations: Throughout his career, Mark Naoshi Kawaguchi has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Mark Naoshi Kawaguchi's relentless pursuit of innovation and his passion for creating technology that shapes the future make him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.

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