The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Jun. 25, 2018
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Mark Kawaguchi, San Carlos, CA (US);
Gregory Blachut, San Jose, CA (US);
Assignee:
LAM RESEARCH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 7/00 (2006.01); H01L 21/677 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0014 (2013.01); H01L 21/0206 (2013.01); H01L 21/02057 (2013.01); H01L 21/02118 (2013.01); H01L 21/02271 (2013.01); H01L 21/02334 (2013.01); H01L 21/67742 (2013.01); H01L 22/26 (2013.01);
Abstract
A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.